Author: Li, L.X.
Paper Title Page
TUZAA02 Highly Charged ECR Ion Source Development at IMP 82
 
  • L.T. Sun, Y. Cao, X. Fang, Y.C. Feng, J.W. Guo, W. Huang, J.Q. Li, L.B. Li, L.X. Li, W. Lu, H.Y. Ma, L.Z. Ma, Y.M. Ma, Z. Shen, B.M. Wu, W. Wu, Y. Yang, W.H. Zhang, X.Z. Zhang, H.W. Zhao
    IMP/CAS, Lanzhou, People’s Republic of China
 
  Highly charged ECR ion source development plays an important role in the heavy ion accelerators advancement at IMP, such as HIRFL upgrade, heavy ion treatment complex HIMM, future heavy ion facility HIAF, and so on. As requested by those projects, many high performance highly charged ECR ion sources with different technologies have been built, or under development. The representative ion sources are superconducting ECR ion sources SECRAL and recently built SECRAL-II, room temperature LECR4 ion source with an innovative evaporative cooling method, permanent magnet ECR ion sources of LAPECR series, and a 45 GHz 4th generation ECR ion source FECR. In this talk, a general review of highly charged ECR ion sources will be presented. The typical performances, operation status, as well as the future developments will be discussed.  
DOI • reference for this paper ※ https://doi.org/10.18429/JACoW-HIAT2018-TUZAA02  
About • paper received ※ 09 November 2018       paper accepted ※ 11 December 2018       issue date ※ 05 November 2019  
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