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Title Impedance and Collective Effects for the Advanced Light Source Upgrade at LBNL
  • S. Persichelli, J.M. Byrdpresenter, S. De Santis, D. Li, T.H. Luo, C. Steier, M. Venturini
    LBNL, Berkeley, California, USA
Abstract The upgrade of the Advanced Light Source (ALS-U) consists of a multiband achromat ultralow emittance lattice for the production of diffraction-limited soft x-rays. A very important issue for ALS-U is represented by instabilities induced by wakefields, that may limit the peak current of individual bunches and the total beam current. In addition, vacuum chamber apertures of few millimeters, that are a key feature of low-emittance machines, can result in a significant increase in the Resistive Wall (RW) impedance. In this paper we present progress on establishing short range wakefield model for ALS-U and evaluating the impact on the longitudinal and transverse single-bunch dynamics.
Funding Work supported by the Director, Office of Science, of the U.S. Department of Energy under Contract No. DE-AC02-05CH11231
Paper download WEPIK106.PDF [0.632 MB / 4 pages]
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Conference IPAC2017, Copenhagen, Denmark
Series International Particle Accelerator Conference (8th)
Proceedings Link to full IPAC2017 Proccedings
Session Posters Wednesday 2
Date 17-May-17   16:00–18:00
Main Classification 05 Beam Dynamics and Electromagnetic Fields
Sub Classification D04 Beam Coupling Impedance - Theory, Simulations, Measurements, Code Developments
Keywords impedance, simulation, wakefield, cavity, vacuum
Publisher JACoW, Geneva, Switzerland
Editors Volker RW Schaa (GSI, Darmstadt, Germany); Gianluigi Arduini (CERN, Geneva, Switzerland); Juliana Pranke (ESS, Lund, Sweden); Mike Seidel (PSI, Villigen, Switzerland); Mats Lindroos (ESS, Lund, Sweden)
ISBN 978-3-95450-182-3
Published May 2017
Copyright © 2017 by JACoW, Geneva, Switzerland     CC-BY Creative Commons License
cc Creative Commons Attribution 3.0